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D. Fukuda, K. Watanabe, Y. Kanazawa, and M. Hashimoto, "Modeling the Effect of Global Layout Pattern on Wire Width Variation for On-The-Fly Etching Process Modification," IEICE Trans. on Fundamentals of Electronics, Communications and Computer Sciences, E98-A(7), pp. 1467--1474, July 2015. | |
ID | 409 |
分類 | 論文誌 |
タグ | |
表題 (title) |
Modeling the Effect of Global Layout Pattern on Wire Width Variation for On-The-Fly Etching Process Modification |
表題 (英文) |
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著者名 (author) |
D. Fukuda,K. Watanabe,Y. Kanazawa,M. Hashimoto |
英文著者名 (author) |
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キー (key) |
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定期刊行物名 (journal) |
IEICE Trans. on Fundamentals of Electronics, Communications and Computer Sciences |
定期刊行物名 (英文) |
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巻数 (volume) |
E98-A |
号数 (number) |
7 |
ページ範囲 (pages) |
1467--1474 |
刊行月 (month) |
7 |
出版年 (year) |
2015 |
Impact Factor (JCR) |
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URL |
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付加情報 (note) |
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注釈 (annote) |
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内容梗概 (abstract) |
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論文電子ファイル | 221.pdf (application/pdf) [一般閲覧可] |
BiBTeXエントリ |
@article{id409, title = {Modeling the Effect of Global Layout Pattern on Wire Width Variation for On-the-Fly Etching Process Modification}, author = {D. Fukuda and K. Watanabe and Y. Kanazawa and M. Hashimoto}, journal = {IEICE Trans. on Fundamentals of Electronics, Communications and Computer Sciences}, volume = {E98-A}, number = {7}, pages = {1467--1474}, month = {7}, year = {2015}, } |