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K. Shinkai, M. Hashimoto, and T. Onoye, "A Gate-Delay Model Focusing on Current Fluctuation Over Wide Range of Process-Voltage-Temperature Variations," Integration, the VLSI Journal, 46(4), pp. 345--358, September 2013. | |
ID | 337 |
分類 | 論文誌 |
タグ | |
表題 (title) |
A Gate-Delay Model Focusing on Current Fluctuation Over Wide Range of Process-Voltage-Temperature Variations |
表題 (英文) |
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著者名 (author) |
K. Shinkai,M. Hashimoto,T. Onoye |
英文著者名 (author) |
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キー (key) |
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定期刊行物名 (journal) |
Integration, the VLSI Journal |
定期刊行物名 (英文) |
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巻数 (volume) |
46 |
号数 (number) |
4 |
ページ範囲 (pages) |
345--358 |
刊行月 (month) |
9 |
出版年 (year) |
2013 |
Impact Factor (JCR) |
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URL |
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付加情報 (note) |
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注釈 (annote) |
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内容梗概 (abstract) |
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論文電子ファイル | 179.pdf (application/pdf) [一般閲覧可] |
BiBTeXエントリ |
@article{id337, title = {A Gate-Delay Model Focusing on Current Fluctuation over Wide Range of Process-Voltage-Temperature Variations}, author = {K. Shinkai and M. Hashimoto and T. Onoye}, journal = {Integration, the VLSI Journal}, volume = {46}, number = {4}, pages = {345--358}, month = {9}, year = {2013}, } |